E-beam lithography on our JEOL SEM

Over the last few days, in cooperation with the University of Iceland and Raith, we have been busy installing a Raith e-beam lithography on our JEOL scanning electron microscope.

Lithography is used for writing patterns down to tens of nanometres with an electron mean. It can be used for making nanodevices, sensors, electrodes as well as photonic structures. This can offer fast prototyping for research and industry where no photomask is needed in fabrication.